DESCRIPTION

The SC7620 is designed for quality thin film deposition from an easy-to-use instrument. Designed for routine applications, the SC7620 uses a basic magnetron sputter head with a simple-to-replace disc target (gold/palladium as standard). The sputtering allows easy operation for extremely thin and uniform conductive film.

ACCESS

Notes: The use of the instrument doesn’t require the precence of a trained operator.LOCATION

CNR-IOM - Istituto Officina dei Materiali,

c/o Area Science Park - Basovizza

Strada Statale 14 km 163,5 - 34149 Trieste

Cleanroom 2

Contact person

Simone Dal Zilio

IOM-CNR | +39-0403756458

mailto:dalzilio@iom.cnr.it

DESCRIPTION

RIE (Reactive Ion Etching) configured with several process gasses including SF6 (Sulfur Hexafluoride), CF4 (tetrafluorometane), O2 (Oxygen), and Ar (Argon). The system is indicated for dry etching of Si, SiO2, Si3N4, resist residual layer removing, Ar milling and surface activation by O2 plasma. The RIE has an Alluminum reaction chamber, suitable for long etching processes.

ACCESS

The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

CNR-IOM - Istituto Officina dei Materiali,

c/o Area Science Park - Basovizza

Strada Statale 14 km 163,5 - 34149 Trieste

Cleanroom 2

Contact person

Simone Dal Zilio

IOM-CNR | +39-0403756458

dalzilio@iom.cnr.it

DESCRIPTION

Cross Beam Zeiss including high resolution SEM and focused ion beam column (FIB). Hgh resolution imaging even at low energies, nano-milling, Electron Beam and Ga ion beam lithography system. As Scanning Electron Microscope (SEM) it has an ultimate resolution of 1 nanometer. The operating voltage range of the electron beam is from 0.7-30kV, and the probe current (10pA - 5nA) with high stability (0.2%/h). The ion beam probe voltage is set to 30 keV and the current range is 1pA – 500nA. Key features of this microscope are the in-column secondary electron detector that provides low-noise imaging during FIB material removal as well as imaging at very low voltages. EDS included in the instrument (EDAX LN cooled)

ACCESS

The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

CNR-IOM - Istituto Officina dei Materiali,

c/o Area Science Park - Basovizza

Strada Statale 14 km 163,5 - 34149 Trieste

Cleanroom 2

Contact person

Simone Dal Zilio

IOM-CNR | +39-0403756458

dalzilio@iom.cnr.it