DESCRIPTION
Dual Beam Helios Nanolab 650 G2 (Thermofisher Scientiffic, US) consist of ultra-high resolution Elstar SEM column with UC monochromator and Tomahawk focused ion beam (FIB) column. The configuration at Nanocenter include: in-column TLD detector, ETD detector, ICE detector, retractable CBS detector (BSE), retractable STEM (BF/DF/HAADF transmission imaging); plasma cleaner; charge compensator; Pt, C and SiOx gas injection system for material deposition; Autoprobe 200 micro-manipulator (Oxford, UK) and X-MAX 50 SDD EDX system (Oxford, UK).
E-Beam: 50V – 30 kV (1.6 pA – 100 nA), resolution: 0.8 nm @ 30 kV (STEM), 0.8 nm @ 15 kV, 0.8 nm @ 2 kV, 0.9 nm @ 1 kV, 1.5 nm @ 200 V.
I-Beam: 500V – 30 kV (4 pA – 65 nA); 4.5/2.5 nm @ 30 kV (PS/SE, method).
Instrument is used for cross-sectional analysis, nano-pattering, TEM sample preparation, 3D tomography and deposition of thin conductive or dielectric films via ion-beam induced deposition.
http://www.nanocenter.si/index.php?page=focused-ion-beam---fib
ACCESS
The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement.
LOCATION
Jozef Stefan Institute
Jamova 39, Ljubljana, Slovenia
room: Building B, basement
Contact person
Gregor Kapun
+386 1 477 3220
info@nanocenter.si