The X-ray scanner is an exposure station designed for deep-etch X-ray lithography using synchrotron radiation to fabricate structures in X-ray sensitive polymers (resists) like PMMA. Shadow projection is used to transfer the absorber structures of a mask membrane into a light sensitive resist layer coated on a base plate.Microstructures can be fabricated with high spatial resolution (200 nm for a wall thickness of 100um) High aspect ratio (up to 40) Great structural heights (up to 3mm). To enable the defined selection of an exposure area, motor-driven aperture blades have been installed in horizontal and vertical direction. DEX02 featured a fully automatic exposure procedure, Scanning speed 1:50 mm/sec. 4” Mask and resist substrate. Resist Material: PMMA, SU8. Set of 5 filters. Exposure Area A=54 mm x 84mm
The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement.
The UV -KUB 3 is a mask aligner designed for laboratories and technological platforms in microelectronics, optics, biology, microfluidics. This UV station features a fully enclosed system ensuring a total user protection against UV rays with an hermetic exposure chamber. Intuitive tactile user interface.Low divergence, strong illumination monochromatic wave lenght.Accepted photomask size 5”x5” (127x127 mm maximum).Accepted substrate size 2” and 4”. Visualization system resolution 3um. Mask/substrate distance resolution 0.5 um. Exposure mode available continue/pulsed.Half angle divergence beam:< 2º.Wavelenght:365 nm.Illumination:35mW/cm^2. The UV station is equipped with a WS-650MZ-23NPPB Spin Coater anda a hot plate
The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement
Soft X-ray microscopy has already been recognized to be a very powerful tool for understanding the complex processes occurring at the submicron length scales. TwinMic soft X-ray microscope of the Elettra Laboratory can provide absorption and differential phase contrast imaging, with spatial resolution from a few micrometers down to 100nm, coupled with low energy X-ray Fluorescence (LEXRF) for elemental mapping of light elements, starting from B and covering the K and L edges of all elements in the energy range 190 to 2200 eV.
The use of the instrument require the presence of a trained operator.
Small Angle X-ray Scattering (SAXS) is a non-destructive method to study the nanoscale structure of any type of material ranging from new composite nanosystems to biological macromolecules. Parameters as (i) averaged particle sizes, shapes and distributions, (ii) the materials' porosity and degree of crystallinity as well as (iii) electron density maps with nanometer precision can be obtained. Materials can be solid, liquid or even exhibit gaseous-like properties as for instance aerosols.
Time-resolved studies on structural transitions can be performed in different time scales down to the sub-millisecond time region in solutions and partly ordered systems containing structures of up to 100 nm in real-space. Also self-assembly processes on surfaces, or structural characterisations of thin films, can be studied.
SAXS measurements can be performed with many different sample environments (i.e. autosampler, flow through cell, humidity cell etc). Simultenously to SAXS, also Differential Scanning Calorimetry (DSC) and Wide Angle X-ray Scattering (WAXS) recordings can be done. Users have the possibility to use our various sample holders (e.g., rapid mixing; T-scans; pressure cell, …), or to install their own specialized sample equipment.
The use of the beamline requires the presence of a trained operator. For prolonged access, training can be provided upon agreement.
Elettra Sincrotrone Trieste,
c/o Area Science Park - Basovizza
Strada Statale 14 km 163,5 - 34149 Trieste, Italy
Dr. Sigrid Bernstorff (Elettra) & Heinz Amenitsch (TU Graz)